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EUV Mask Cleaner
The purpose of the equipment is a clean system for 150mm EUV mask backside cleaning process.
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Left side of the unit
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Right side of the unit
Location of each module
- Loadport：a placement tray for each photomask pod
- Robot：the robot is used to transport masks
- Mask flipper：the flipper is purposed to flip photomasks
- AP+USC chamber：this is where the masks process with atmosphere-pressure plasma and ultrasonic cleaning
- Clean chamber：this chamber is where masks are cleaned with brush
- AP controller：Atmospheric-pressure plasma module control area
- CDM：clean chamber pipeline area
- Electronic/utility/GUI: this is where other supplemental equipment is stored
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EFEM mask flip module
Photomasks require flipping during manufacturing to ensure thorough cleaning, which is conducted by this module -
EFEM Mask Transport Robot
Masks are transported across various stations via this robotics. Two grippers are set up to meet the needs of the photomask box
AP + USC Chamber_1
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Mask grippers are set up inside the facility
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connected with the robotics to allow masks entry into Chamber_1
Chamber _1 AP+UCS HEAD
Clean Chamber _2
Control unit area