Mask Clean

GPTC's mask cleaners are primarily used for cleaning 9-inch and 14-inch photomasks. The cleaners feature a rotating photomask that works well with high-pressure water sprays, brushes or cleaning chemicals to effectively remove adhesive photoresists on the photomasks.

An example of the cleaner is shown below
 

Varying degrees of impurities and contaminants are often found on the photomask as the result of residual adhesive photoresists during exposure. Potassium hydroxide, sulfuric acid, or NMP are chemicals commonly used in cleaning photomasks. That said, photomask cleaners and the interiors of the cleaning chamber are designed with acid- and alkaline-resistant materials to address the use of chemicals. The recycling and filtering systems of the equipment can effectively reduce the use of chemicals. The cleaner is also customization-ready to meet different needs: it can be incorporated with a high-pressure rinsing system, or a combination of physical/chemical cleaning system - such as brushes with solvents - to rinse off both organic and inorganic impurities.
  • The figure on the left is a schematic of GPTC's Auto Photomask Cleaning system. It can accommodate two photomasks and two cleaning chambers to increase throughput

  • On the right is a close-up of the cleaning chamber. Different sizes of chuck systems can be readily replaced

Advantages:
  • Customization-ready cleaning features
  • Flexible manufacturing adjustment to accommodate different needs
  • Reduction in chemical use
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